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Practice over 1000+ GATE-level questions from this topic!

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Q#1 Fabrication GATE EC 2018 NAT +1 mark -0 marks

There are two photolithography systems: one with light source of wavelength (System 1) and another with light source of wavelength (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are  and  respectively, the ratio (correct to two decimal places) is

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Network Analysis 273 0 0
Electronic Devices 224 0 0
Analog Electronics 395 0 0
Digital Electronics 352 0 0
Signals and Systems 263 0 0
Control Systems 264 0 0
Communication System 340 0 0
EMFT - ECE 273 0 0
Engineering Mathematics 280 0 0
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